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Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits pictures & photos
Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits pictures & photos
Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits pictures & photos
Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits pictures & photos
Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits pictures & photos
Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits pictures & photos
  • Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits
  • Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits
  • Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits
  • Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits
  • Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits
  • Factory Wholesale China 99.999% Carbon Tetrafluoride CF4 R14 Used in Plasma Etching Process for Various Integrated Circuits
CAS No.: 75-73-0
Formula: CF4
EINECS: 75-73-0
Constituent: Industrial Pure Air
Grade Standard: Electronic Grade
Chemical Property: Non-Flammable Gas

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