High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching

Product Details
CAS No.: 75-73-0
Formula: CF4
EINECS: 75-73-0

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Main Products
Industrial Gas; Special Gas; Rare Gas; Mixture Gas
Number of Employees
39
  • High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching
  • High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching
  • High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching
  • High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching
  • High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching
  • High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching
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  • Overview
  • Product Description
  • Why Choose us
  • Company Profile
  • Packaging & Shipping
  • FAQ
  • Contact us
Overview

Basic Info.

Model NO.
CF4 Gas
Constituent
Industrial Pure Air
Grade Standard
Electronic Grade
Chemical Property
Non-Flammable Gas
Molecular Weight
88
Density
3.72 Kg/M3;
Melting Point
-184 C
Boiling Point
-128.1 C
Appearance
Colorless, Odorless
Un Number
Un 1982
DOT Class
2.2
Valve
Cga580
Cylinder Standard
DOT/ISO/GB
Cylinder Pressure
15MPa/20MPa
Transport Package
40L, 47L, 50L
Specification
99.999%
Trademark
TYHJ
Origin
China
HS Code
28261990
Production Capacity
2000 Tons/Year

Product Description

 
Product Description

High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry EtchingCarbon tetrafluorideis a cryogenic refrigerant that is relatively inert under normal conditions, an oxygen displacer, and is also used in various wafer etching processes.
CF4 is currently the most widely used plasma etching gas in the microelectronics industry. It can be widely used in the etching of thin film materials such as silicon, silicon dioxide, silicon nitride, phosphosilicate glass and tungsten, and in surface cleaning of electronic devices and solar cells. It is also widely used in the production of laser technology, gas phase insulation, low-temperature refrigeration, leak detection agents, controlling the attitude of space rockets, and decontamination agents in printed circuit production. 
Due to the chemical stability of carbon tetrafluoride, carbon tetrafluoride can be used in metal smelting and plastic industries


Specifications:

Specifications Company Standard
CF4 ≥ 99.999%
O2+AR  1 ppm
N2  2 ppm
H2  0.3 ppm
CO  0.3 ppm
CO2  0.3 ppm
SF6  0.3 ppm
THC  0.3 ppm
OFC  1 ppm
Moisture  1 ppm

 

Why Choose us

High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching

Company Profile

High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching

Packaging & Shipping

High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry EtchingHigh Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching

FAQ

High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching

Q: What's TAIYU main sales products?

A: We mainly supply specialty gases and gas equipments.

 

Q:What's TAIYU order MOQ?

A: We advice our customer one container at least , anyway we prefer our clients demand.

 

Q:How long is the delivery time?

A:Normally 30 days after deposit paid.

 

Q:Which port will you ship?

A: HongKong, QingDao , Shanghai or according to customers' demand.

 

Q:Can you provide Assurance Trade Order ?

A: Yes if you just purchase empty gas cylinder.

 

Q:Can we visit Taiyu factory ?
A: Welcome to our factory , we will serve for you best.

Contact us

Chengdu Taiyu Industrial Gases Co., Ltd

 
Add:Room 1104, 4th Building, Stage II,Shudu Center Building, High-Tech Zone, Chengdu City, China.

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